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FHR Anlagenbau GmbH, which is based at Ottendorf-Okrilla, Germany, specializes in the development of innovative thin film technologies, sputtering and evaporation systems. The company, which was founded in 1991 in Dresden, has formed part of the centrotherm photovoltaics Group since 2008. The FHR product portfolio comprises vacuum process systems for R&D applications, and technology and equipment for the production of CIGS solar cells and solar thermal power plants.
Advanced deposition technologies by sputtering, thermal evaporation, CVD and PECVD
Reactive sputtering technologies for deposition of oxides and nitrides
Advanced etching technologies by support of high density plasma sources
Flash Lamp Annealing (FLA; annealing in the millisecond regime) for treatment and modification (e.g. recrystallisation, electrical activation) of semiconductors, metals, ceramics, nanostructures and photonic materials
Atomic Layer Deposition (ALD) for precisely controlled growth of monolayer stacks (e.g. conductive and insulating layers, barrier and adhesion layers, optical layers) joined with excellent uniformity of thickness on complex 3D shapes
FHR is offering upon request all kinds of target materials, optionally bonded to specially designed backing plates. We deliver materials, matched in their quality parameters in an optimal way to the requirements of the purposed thin-film application. We provide sputtering targets with individual dimensions up to 4,000 mm.
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